Multipurpose Processor/Spin Processor


semi-multipurpose1-img.jpg
We have a case unlike the real thing to a product of a photograph.
  Model TMS-401
 
icon.gifFeature
    It corresponds to the acid and the solvent by two kinds of body materials. (Please consults withus whenyouwillstudy.The photo is PVC body. )
Multipurpose equipment that can be used for etching, cleaning, development, stripping dry etc.
 
icon.gifSpecification
   
Worksize: Φ2 inch Φ8 inch
Clean unit HEPA filter
Cleaning Brush and MS asstandard
Acid specification Acid and alkali type
Solvent specification IPA . Various solution such as acetones
Option High-pressure jet nozzle and chemicalnozzle , Filter,etc.
Power supply AC100v or200v

It is designed by customers spec, and various applications can be corresponded easily.
     


Multipurpose Processor/Spin Etcher


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We have a case unlike the real thing to a product of a photograph.
  Model TMS-410E
 
icon.gifFeature
    Temperature control, drainage selection, and various functions can be added. (The photo is teflon + PVC body. )
 
icon.gifSpecification
   
Worksize: Φ2 inch Φ8 inch
Acid solution Acid and alkali type
Clean unit HEPA filter
Option selectable2-4 drains, and nozzles for chemical,Filter
Power supply AC100v or200v
CDA. more0.5Mpa .
DIW. more0.2Mpa .

It is designed by customers spec, and various applications can be corresponded easily.
     

Multiple Spinner


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We have a case unlike the real thing to a product of a photograph.
  Model TMSC-6000
 
icon.gifFeature
    Cassette to cassette type automatic multipurpose processor to be equipped with clean unit. (The photograph is coater + developer + hot plate. )
 
icon.gifSpecification
   
Worksize: Φ6 inch Φ12 inch
Worktransfer Three atmospheric axis clean robot
Clean unit ULPA filter
Data set display Liquid crystal touch panel
Coater Two nozzle and back rinse as standard
Developer Chemicaltemperature-controller, nozzle cleaning function, and back rinse asstandard
Hot plate 3 steps for Drying + cooling
Option SpinCleaner,SpinCoater,SpinDeveloper,Spinţ,SpinRemoverSpinDryerof6 functionscanbedoneinoneequipment,oryoucanchooseyourrequiredfunctions. High-pressure jet nozzle, UV, excimer, hot plate, Filter,etc.
Utility Power supply, CDA., nitrogen, DIW., exhaust, Drain, etc.

It is designed by customers spec, and various applications can be corresponded easily.
     
     

Developer


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We have a case unlike the real thing to a product of a photograph.
  ame  Compact Type Developer
odel  AD-1200
 
icon.gifFeatures
    High Performance,Low Cost,Compact Desk Top Type
Work Size:Φ"Φ6"
Easy Operation for Programming with LCD Touch Panel
2 Lines of Chemical Supply Pump Equipped
   
     
     







icon.gifSpecifications

Number of Wafer Φ150mm or 100mm(MAX) 1
Φ”Φ”
Process DevelopingFluid 
Rinse
(Micro Pump will supply the fluid without pulse.)
Chemical AlkalineDeveloping Fluid,Alcoholic Solution
Process Time ͣ㡥
Σ򡡣桡ң rpmʣ졡ˡ
Σ塡ͣ ӣ Angle can be selectable by programming.
Fixing at center can be also available.
Dimensions 550W×400D×440H mm.
(When Lid open:740H mm.)
Approx.33kg.
Power Supply AC100V 4A
Vacuum ݣˣУᡥor less
Exhaust 0.3m3/min.


icon.gifComposition 

 Main Unit   

 

Chamber  SUS
Rotation Unit  3 step of Anti-Chemical Axis Seal
Vacuum Line for    R
Chemical Supply 2 Micro Pump for Developing Fluid and Rinse Fluid
Chemical Injection  Spray Injection
 SS(orCeramic)Nozzle shaped Full-Corn or Flat-Corn
Paddle Injection   Straight nozzle
Swing Nozzle Type(when Spray Injection)
 Swing angle can be selectable according to the diameter ofwafer. 
   Nozzle will swing while injecting  chemical.

 Control Unit

Sequence 

Number of Step        24 steps
Programming Mode    10 modes

Inter Lock 

Vacuum Absorption Sensor
Open-Lid Inter-Lock
Over-run Limiter for Nozzle movement

Options Chemical Temperature Control System
Various Sample Holder(Vacuum Type,Mechanical Chuck Type
Mist Trap
Vacuum Pump for Vacuum Absorption
Working Desk
  
        

Etcher

semi-etching-img.jpg
We have a case unlike the real thing to a product of a photograph
  Name Compact Type Etcher
Model ED-1200
 
icon.gifFeatures
    High Performance,Low Cost,Compact Desk Top Type
Work Size:Φ"Φ6"
Easy Operation for Programming with LCD Touch Panel
2 Lines of Chemical Supply Pump Equipped
 
     

icon.gifSpecifications

Number of Wafer Φ150mm or 100mm(MAX) 1
Φ”Φ”
Process EtchingFluid     
Rinse Fluid 
(Micro Pump will supply the fluid without pulse.)
Chemical A䡡ţing Solution
Process Time ͣ㡥
Σ򡡣桡ң rpmʣ졡ˡ
Σ塡ͣ ӣ Angle can be selectable by programming.
Fixing at center can be also available.
Dimensions 550W×400D×440H mm.
(When Lid open:740H mm.)
Approx.33kg.
Power Supply AC100V 4A
Vacuum -ˣУᡥ or less
Exhaust 0.3m3/min.


icon.gifComposition 

 Main Unit   

 

Chamber  У֣
Rotation Unit  3 step of Anti-Chemical Axis Seal
Vacuum Line for    R
Chemical Supply 2 Micro Pump for ţing Fluid and Rinse Fluidʣģɡף
Chemical Injection  Spray Injection
 ƣshaped Flat-Corn Σ
Swing Nozzle Type(when Spray Injection)
 Swing angle can be selectable according to the diameter ofwafer. 
   Nozzle will swing while injecting  chemical.

 Control Unit

Sequence 

Number of Step        24 steps
Programming Mode    10 modes

Inter Lock 

Vacuum Absorption Sensor
Open-Lid Inter-Lock
Over-run Limiter for Nozzle movement

Options Chemical Temperature Control System
Various Sample Holder(Vacuum Type,Mechanical Chuck Type
Mist Trap
Vacuum Pump for Vacuum Absorption
Working Desk



ҥȡӡTEL:0471-84-7255 or 080-4075-1975ʹⶶ
270-1164ո¹һԤĤ4-6-1-102